Band Gap and Electronic structure of an Epitaxial, Semiconducting Cr0.80Al0.20 Thin Film

Cr(1-x)Alx exhibits semiconducting behavior for x=0.15-0.26. This Letter uses hard x-ray photoemission spectroscopy and density functional theory to further understand the semiconducting behavior. Photoemission measurements of an epitaxial Cr0.80Al0.20 thin film show several features in the band region, including a gap at the Fermi energy (Ef) for which the valence band edge is 95 +- 14 meV below Ef. Theory agrees well with the valence band measurements, and shows an incomplete gap at Ef due to the hole band at M shifting almost below Ef.

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Main Authors: Boekelheide, Z., Gray, A. X., Papp, C., Balke, B., Stewart, D. A., Ueda, S., Kobayashi, K., Hellman, F., Fadley, C. S.
Format: article biblioteca
Language:en_US
Published: American Physical Society 2010-12-03
Subjects:alloy, chromium, aluminum, electronic structure, photoemission, density functional theory, CrAl, band gap,
Online Access:https://hdl.handle.net/1813/19474
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spelling dig-cornell-us-1813194742015-07-08T04:17:15Z Band Gap and Electronic structure of an Epitaxial, Semiconducting Cr0.80Al0.20 Thin Film Boekelheide, Z. Gray, A. X. Papp, C. Balke, B. Stewart, D. A. Ueda, S. Kobayashi, K. Hellman, F. Fadley, C. S. alloy chromium aluminum electronic structure photoemission density functional theory CrAl band gap Cr(1-x)Alx exhibits semiconducting behavior for x=0.15-0.26. This Letter uses hard x-ray photoemission spectroscopy and density functional theory to further understand the semiconducting behavior. Photoemission measurements of an epitaxial Cr0.80Al0.20 thin film show several features in the band region, including a gap at the Fermi energy (Ef) for which the valence band edge is 95 +- 14 meV below Ef. Theory agrees well with the valence band measurements, and shows an incomplete gap at Ef due to the hole band at M shifting almost below Ef. This work was supported by the U.S. Department of Energy under Contract No. DE-AC02-05CH11231 and the Nanotechnology Network Project, MEXT, Japan. C. Papp and B. Balke thank the Humboldt foundation for support. Calculations were done at the Cornell Nanoscale Facility, part of the National Nanotechnology Infrastructure Network (NNIN) funded by NSF. HXPS experiments were approved at the NIMS Beamline Station (Proposal No. 2009A4906) 2010-12-10T20:22:47Z 2010-12-10T20:22:47Z 2010-12-03 article Z. Boekelheide, A. X. Gray, C. Papp, B. Balke, D. A. Stewart, S. Ueda, K. Kobayashi, F. Hellman, and C. S. Fadley, Physical Review Letters, 105, 236404 (2010) DOI:10.1103/PhysRevLett.105.236404 https://hdl.handle.net/1813/19474 en_US application/pdf American Physical Society
institution CORNELL US
collection DSpace
country Estados Unidos
countrycode US
component Bibliográfico
access En linea
databasecode dig-cornell-us
tag biblioteca
region America del Norte
libraryname Biblioteca de Cornell
language en_US
topic alloy
chromium
aluminum
electronic structure
photoemission
density functional theory
CrAl
band gap
alloy
chromium
aluminum
electronic structure
photoemission
density functional theory
CrAl
band gap
spellingShingle alloy
chromium
aluminum
electronic structure
photoemission
density functional theory
CrAl
band gap
alloy
chromium
aluminum
electronic structure
photoemission
density functional theory
CrAl
band gap
Boekelheide, Z.
Gray, A. X.
Papp, C.
Balke, B.
Stewart, D. A.
Ueda, S.
Kobayashi, K.
Hellman, F.
Fadley, C. S.
Band Gap and Electronic structure of an Epitaxial, Semiconducting Cr0.80Al0.20 Thin Film
description Cr(1-x)Alx exhibits semiconducting behavior for x=0.15-0.26. This Letter uses hard x-ray photoemission spectroscopy and density functional theory to further understand the semiconducting behavior. Photoemission measurements of an epitaxial Cr0.80Al0.20 thin film show several features in the band region, including a gap at the Fermi energy (Ef) for which the valence band edge is 95 +- 14 meV below Ef. Theory agrees well with the valence band measurements, and shows an incomplete gap at Ef due to the hole band at M shifting almost below Ef.
format article
topic_facet alloy
chromium
aluminum
electronic structure
photoemission
density functional theory
CrAl
band gap
author Boekelheide, Z.
Gray, A. X.
Papp, C.
Balke, B.
Stewart, D. A.
Ueda, S.
Kobayashi, K.
Hellman, F.
Fadley, C. S.
author_facet Boekelheide, Z.
Gray, A. X.
Papp, C.
Balke, B.
Stewart, D. A.
Ueda, S.
Kobayashi, K.
Hellman, F.
Fadley, C. S.
author_sort Boekelheide, Z.
title Band Gap and Electronic structure of an Epitaxial, Semiconducting Cr0.80Al0.20 Thin Film
title_short Band Gap and Electronic structure of an Epitaxial, Semiconducting Cr0.80Al0.20 Thin Film
title_full Band Gap and Electronic structure of an Epitaxial, Semiconducting Cr0.80Al0.20 Thin Film
title_fullStr Band Gap and Electronic structure of an Epitaxial, Semiconducting Cr0.80Al0.20 Thin Film
title_full_unstemmed Band Gap and Electronic structure of an Epitaxial, Semiconducting Cr0.80Al0.20 Thin Film
title_sort band gap and electronic structure of an epitaxial, semiconducting cr0.80al0.20 thin film
publisher American Physical Society
publishDate 2010-12-03
url https://hdl.handle.net/1813/19474
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