Band Gap and Electronic structure of an Epitaxial, Semiconducting Cr0.80Al0.20 Thin Film

Cr(1-x)Alx exhibits semiconducting behavior for x=0.15-0.26. This Letter uses hard x-ray photoemission spectroscopy and density functional theory to further understand the semiconducting behavior. Photoemission measurements of an epitaxial Cr0.80Al0.20 thin film show several features in the band region, including a gap at the Fermi energy (Ef) for which the valence band edge is 95 +- 14 meV below Ef. Theory agrees well with the valence band measurements, and shows an incomplete gap at Ef due to the hole band at M shifting almost below Ef.

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Bibliographic Details
Main Authors: Boekelheide, Z., Gray, A. X., Papp, C., Balke, B., Stewart, D. A., Ueda, S., Kobayashi, K., Hellman, F., Fadley, C. S.
Format: article biblioteca
Language:en_US
Published: American Physical Society 2010-12-03
Subjects:alloy, chromium, aluminum, electronic structure, photoemission, density functional theory, CrAl, band gap,
Online Access:https://hdl.handle.net/1813/19474
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Summary:Cr(1-x)Alx exhibits semiconducting behavior for x=0.15-0.26. This Letter uses hard x-ray photoemission spectroscopy and density functional theory to further understand the semiconducting behavior. Photoemission measurements of an epitaxial Cr0.80Al0.20 thin film show several features in the band region, including a gap at the Fermi energy (Ef) for which the valence band edge is 95 +- 14 meV below Ef. Theory agrees well with the valence band measurements, and shows an incomplete gap at Ef due to the hole band at M shifting almost below Ef.