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Emerging Technologies for In Situ Processing [electronic resource] /
1. In-Situ Processing Combining MBE, Lithography and Ion-Implantation -- 2. Motivations and Early Demonstrations for In-Situ Processings For III-V Semiconductor Devices -- 3. Laser Etching and Microelectronic Applications -- 4. Laser-Induced Chemical Processing of Materials -- 5. High Technology Manufacturing: Critical Issues for the Future -- 6. Ultra High Vacuum Processing: MBE -- 7. Epitaxial Growth of III-V Materials on Implanted III-V Substrates -- 8. Mechanisms of Laser-Induced Deposition from the Gas Phase -- 9. Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition of Platinum -- 10. Excimer Laser Projection Patterning -- 11. Excimer Laser Patterning and Etching of Metals -- 12. Ion Projection Lithography -- 13. UV Light-Assisted Deposition of A1 on Si from TMA -- 14. E-Beam Induced Decomposition of Inorganic Solids -- 15. Electronic Connection Through Silicon Wafers -- 16. The Development and Use of Novel Precursors for Photolytic Deposition of Dielectric Films -- 17. Focused Ion Beam Induced Deposition -- 18. Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks -- 19. Confirmation of the Wavelength Dependence of Silicon Oxidation Induced By Visible Radiation -- 20. Focused Ion Beam Technology and Applications -- 21. Laser Direct Writing for Device Applications -- 22. Laser-Induced Photoetching of Semiconductors with Chlorine -- 23. Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication -- 24. Synthesis and Characterization of Laser Driven Powders -- 25. Physical Properties of Laser Written Chromium Oxide Thin Films -- 26. UV Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime -- 27. Laser Assisted Plasma Etching of Silicon Dioxide -- 28. Nd: Yag Laser Processing for Circuit modification and Direct Writing of Silicon Conductors -- 29. Study of Excimer laser Enhanced Etching of Copper and Silicon With (SUB) Monolayer Coverages of Chlorine -- 30. Surface Chemical Probes and Their Application to the Study of In Situ Semicmductor Processing.
| Main Authors: | , , |
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| Format: | Texto biblioteca |
| Language: | eng |
| Published: |
Dordrecht : Springer Netherlands,
1988
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| Subjects: | Materials science., Electrical engineering., Materials Science., Characterization and Evaluation of Materials., Electrical Engineering., |
| Online Access: | http://dx.doi.org/10.1007/978-94-009-1409-4 |
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| Summary: | 1. In-Situ Processing Combining MBE, Lithography and Ion-Implantation -- 2. Motivations and Early Demonstrations for In-Situ Processings For III-V Semiconductor Devices -- 3. Laser Etching and Microelectronic Applications -- 4. Laser-Induced Chemical Processing of Materials -- 5. High Technology Manufacturing: Critical Issues for the Future -- 6. Ultra High Vacuum Processing: MBE -- 7. Epitaxial Growth of III-V Materials on Implanted III-V Substrates -- 8. Mechanisms of Laser-Induced Deposition from the Gas Phase -- 9. Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition of Platinum -- 10. Excimer Laser Projection Patterning -- 11. Excimer Laser Patterning and Etching of Metals -- 12. Ion Projection Lithography -- 13. UV Light-Assisted Deposition of A1 on Si from TMA -- 14. E-Beam Induced Decomposition of Inorganic Solids -- 15. Electronic Connection Through Silicon Wafers -- 16. The Development and Use of Novel Precursors for Photolytic Deposition of Dielectric Films -- 17. Focused Ion Beam Induced Deposition -- 18. Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks -- 19. Confirmation of the Wavelength Dependence of Silicon Oxidation Induced By Visible Radiation -- 20. Focused Ion Beam Technology and Applications -- 21. Laser Direct Writing for Device Applications -- 22. Laser-Induced Photoetching of Semiconductors with Chlorine -- 23. Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication -- 24. Synthesis and Characterization of Laser Driven Powders -- 25. Physical Properties of Laser Written Chromium Oxide Thin Films -- 26. UV Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime -- 27. Laser Assisted Plasma Etching of Silicon Dioxide -- 28. Nd: Yag Laser Processing for Circuit modification and Direct Writing of Silicon Conductors -- 29. Study of Excimer laser Enhanced Etching of Copper and Silicon With (SUB) Monolayer Coverages of Chlorine -- 30. Surface Chemical Probes and Their Application to the Study of In Situ Semicmductor Processing. |
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