Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS

Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS

AbstractIn this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.

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Main Authors: Merij,Abrão Chiaranda, Sugahara,Tarcila, Martins,Gislene Valdete, Silva Sobrinho,Argemiro Soares da, Reis,Danieli Aparecida Pereira, Gonçalves,Polyana Alves Radi, Massi,Marcos
Format: Digital revista
Language:English
Published: ABM, ABC, ABPol 2015
Online Access:http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000500904
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spelling oai:scielo:S1516-143920150005009042015-10-19Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMSMerij,Abrão ChiarandaSugahara,TarcilaMartins,Gislene ValdeteSilva Sobrinho,Argemiro Soares daReis,Danieli Aparecida PereiraGonçalves,Polyana Alves RadiMassi,Marcos adhesion Cr interlayer HiPIMS SiC thin film AbstractIn this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.info:eu-repo/semantics/openAccessABM, ABC, ABPolMaterials Research v.18 n.5 20152015-10-01info:eu-repo/semantics/articletext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000500904en10.1590/1516-1439.313114
institution SCIELO
collection OJS
country Brasil
countrycode BR
component Revista
access En linea
databasecode rev-scielo-br
tag revista
region America del Sur
libraryname SciELO
language English
format Digital
author Merij,Abrão Chiaranda
Sugahara,Tarcila
Martins,Gislene Valdete
Silva Sobrinho,Argemiro Soares da
Reis,Danieli Aparecida Pereira
Gonçalves,Polyana Alves Radi
Massi,Marcos
spellingShingle Merij,Abrão Chiaranda
Sugahara,Tarcila
Martins,Gislene Valdete
Silva Sobrinho,Argemiro Soares da
Reis,Danieli Aparecida Pereira
Gonçalves,Polyana Alves Radi
Massi,Marcos
Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
author_facet Merij,Abrão Chiaranda
Sugahara,Tarcila
Martins,Gislene Valdete
Silva Sobrinho,Argemiro Soares da
Reis,Danieli Aparecida Pereira
Gonçalves,Polyana Alves Radi
Massi,Marcos
author_sort Merij,Abrão Chiaranda
title Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
title_short Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
title_full Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
title_fullStr Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
title_full_unstemmed Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
title_sort use of cr interlayer to promote the adhesion of sic films deposited on ti-6al-4v by hipims
description AbstractIn this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.
publisher ABM, ABC, ABPol
publishDate 2015
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000500904
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