Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS

Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS

AbstractIn this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.

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Bibliographic Details
Main Authors: Merij,Abrão Chiaranda, Sugahara,Tarcila, Martins,Gislene Valdete, Silva Sobrinho,Argemiro Soares da, Reis,Danieli Aparecida Pereira, Gonçalves,Polyana Alves Radi, Massi,Marcos
Format: Digital revista
Language:English
Published: ABM, ABC, ABPol 2015
Online Access:http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000500904
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