Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

In this paper SiOx thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiOx thin films were deposited at different oxygen concentrations in the Ar+O2 plasma forming gas. After deposition processes, SiOx thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O2 increased the bond strength to (32.8 ± 5.4) MPa. This value has not been achieved by traditional methods.

Bibliographic Details

Main Authors:	Queiroz,José Renato Calvacanti de, Duarte,Diego Alexandre, Souza,Rodrigo Othávio de Assunção e, Fissmer,Sara Fernanda, Massi,Marcos, Bottino,Marco Antonio
Format:	Digital revista
Language:	English
Published:	ABM, ABC, ABPol 2011
Online Access:	http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392011000200012
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