Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy
We have observed changes in the morphology of InP films grown in epi-ready substrates and on patterns created by photo and plow-mode AFM lithography. These changes are attributed to different levels of contamination of the surface, which favor nucleation of clusters over a two-dimensional film for the lithography-processed surface. The area of nucleation is smaller than the dimensions of the patterns created by lithography, so no size effects due to the presence of the pattern could be observed. The film morphologies exhibited well defined exponents for system sizes smaller than 0.2 mum but no defined growth exponent.
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| Main Authors: | , , , , |
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| Format: | Digital revista |
| Language: | English |
| Published: |
Sociedade Brasileira de Física
1999
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| Online Access: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400031 |
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