Síntese e caracterização de nanocompósitos Ni: SiO2 processados na forma de filmes finos

We have produced nanocomposite films of Ni:SiO2 by an alternative polymeric precursor route. Films, with thickness of ~ 1000 nm, were characterized by several techniques including X-ray diffraction, scanning electron microscopy, atomic force microscopy, flame absorption atomic spectrometry, and dc magnetization. Results from the microstructural characterizations indicated that metallic Ni-nanoparticles with average diameter of ~ 3 nm are homogeneously distributed in an amorphous SiO2 matrix. Magnetization measurements revealed a blocking temperature T B ~ 7 K for the most diluted sample and the absence of an exchange bias suggesting that Ni nanoparticles are free from an oxide layer.

Bibliographic Details

Main Authors:	Gouveia,Paulo Sérgio, Escote,Marcia Tsuijama, Longo,Elson, Leite,Edson R., Carreño,Neftali L. V., Fonseca,Fabio C., Jardim,Renato de F.
Format:	Digital revista
Language:	Portuguese
Published:	Sociedade Brasileira de Química 2005
Online Access:	http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0100-40422005000500022
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