Handbook of Advanced Plasma Processing Techniques [electronic resource] /

This volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectronics. The use of plasmas for patterning on a submicron scale has enabled successive generations of continually smaller transistors, lasers, micromachines, sensors and magnetic read/write heads that have formed the basis of our information age. This volume is the first to give coverage to this broad area of topics in a detailed fashion, especially in the rapidly expanding fields of micro-mechanical machines, photomask fabrication, magnetic data storage and reactor modeling. It provides the reader with a broad array of topics, authored by the leading experts in the field.

Bibliographic Details

Main Authors:	Shul, Randy J. editor., Pearton, Stephen J. editor., SpringerLink (Online service)
Format:	Texto biblioteca
Language:	eng
Published:	Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2000
Subjects:	Materials science., Atoms., Physics., Engineering., Industrial engineering., Optical materials., Electronic materials., Materials, Thin films., Materials Science., Surfaces and Interfaces, Thin Films., Atomic, Molecular, Optical and Plasma Physics., Optical and Electronic Materials., Operating Procedures, Materials Treatment., Engineering, general., Characterization and Evaluation of Materials.,
Online Access:	http://dx.doi.org/10.1007/978-3-642-56989-0
Tags:	Add Tag No Tags, Be the first to tag this record!