Materials Modification by High-fluence Ion Beams [electronic resource] /

Overview -- High-fluence ion irradiation: an overview -- Sputtering -- Historical overview on the fundamentals of sputtering -- Depth of origin of sputtered atoms -- Magnetron sputtering: physics and design -- On the formation and characterization of microcrystalline Si:H prepared by RF magnetron sputtering -- Depth profiling of Ta2O5 thin layer on Ta foil by ion scattering spectrometry and ion sputtering -- Bombardment of alkali and alkali-earth halides by ions and electrons -- Effects of Ar+ angle-of-incidence on the etching of Si with Cl2 and low-energy Ar+ ions -- Irradiation effects in ices by energetic ions -- Ion formation by very high energetic ion impact on solids -- Simulation -- Computer simulation of stopping and sputtering -- Computer simulation of ion-beam mixing of cobalt on silicon -- On the fractal nature of collision cascades -- Simple statistical models for erosion and growth -- Defects and Disorder -- Defects and defect processes -- Fast-ion-induced defects in silicon studied by deep level transient spectroscopy -- Low-energy (300 eV — 10 keV) Ar+ and Cl+ ion irradiation of (100) Si -- The charge state of iron implanted into sapphire -- Implantation and Mixing -- Direct and recoil implantation, and collisional ion-beam mixing: recent low-temperature experiments -- Mixing by defect-assisted migration of thin markers in solids -- The TRIUMF optically pumped polarized H- ion source -- Some high-current ion sources for materials modification -- Compositional and Chemical Changes -- Bombardment-induced compositional change with alloys, oxides, and oxysalts. I The role of the surface binding energy -- Investigation of preferential sputtering mechanisms by analysing the sample surface and near-surface region with AES and ISS -- High-fluence implantation in insulators. Part I: Compositional, mechanical, and optical changes -- High-fluence implantation in insulators. Part II: Chemical changes -- Electrochemical and corrosion behaviour of ion and laser-beam modified metal surfaces -- Structural Changes -- Ion-irradiation induced phase changes in metallic systems -- The topography of ion-bombarded surfaces -- Cultured blisters -- Electronic Changes -- Electronic properties of ion-implanted metals -- Mechanical Changes -- Tribology of implantation bilayers -- Adhesive and abrasive wear study of nitrogen implanted steels -- Effect of ?-recoil damage on the elastic moduli of zircon and tourmaline -- Depth-resolved investigation of structural transformations and hardness variations in implanted films on bulk samples -- Laser Processing -- Laser etching as an alternative -- Pulsed laser irradiation of heavily Ge implanted silicon.

Bibliographic Details

Main Authors:	Kelly, Roger. editor., Silva, M. Fernanda da. editor., SpringerLink (Online service)
Format:	Texto biblioteca
Language:	eng
Published:	Dordrecht : Springer Netherlands, 1989
Subjects:	Materials science., Electrical engineering., Materials, Thin films., Materials Science., Characterization and Evaluation of Materials., Electrical Engineering., Surfaces and Interfaces, Thin Films.,
Online Access:	http://dx.doi.org/10.1007/978-94-009-1267-0
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