Thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysis

The application of Zinc Oxide (ZnO) films by ultrasonic spray pyrolysis at 250, 300 and 450°C as active layer in thin-film Transistors (TFTs) is presented. The performance of the devices shows an unexpected behavior in function of the deposition temperature. The ZnO films were deposited from 0.2 M precursor solution of Zinc acetate in methanol, using air as carrier gas. 70nm-thick ZnO was deposited over 100 nm-thick aluminum electrodes patterned on 50 nm-thick thermally grown SiO2 on highly doped Si wafers. The highly doped Si wafer was used as the gate electrode. The ZnO TFTs at 250°C showed field-effect mobilities around of 0.05 cm²/Vs and threshold voltages of 8 V.

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Main Authors: Dominguez-Jimenez,M.A., Flores-Gracia,F., Luna-Flores,A., Martinez-Juarez,J., Luna-Lopez,J.A., Alcantara-Iniesta,S., Rosales-Quintero,P., Reyes-Betanzo,C.
Format: Digital revista
Language:English
Published: Sociedad Mexicana de Física 2015
Online Access:http://www.scielo.org.mx/scielo.php?script=sci_arttext&pid=S0035-001X2015000200007
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spelling oai:scielo:S0035-001X20150002000072015-05-12Thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysisDominguez-Jimenez,M.A.Flores-Gracia,F.Luna-Flores,A.Martinez-Juarez,J.Luna-Lopez,J.A.Alcantara-Iniesta,S.Rosales-Quintero,P.Reyes-Betanzo,C. ZnO electrical properties thin film transistors The application of Zinc Oxide (ZnO) films by ultrasonic spray pyrolysis at 250, 300 and 450°C as active layer in thin-film Transistors (TFTs) is presented. The performance of the devices shows an unexpected behavior in function of the deposition temperature. The ZnO films were deposited from 0.2 M precursor solution of Zinc acetate in methanol, using air as carrier gas. 70nm-thick ZnO was deposited over 100 nm-thick aluminum electrodes patterned on 50 nm-thick thermally grown SiO2 on highly doped Si wafers. The highly doped Si wafer was used as the gate electrode. The ZnO TFTs at 250°C showed field-effect mobilities around of 0.05 cm²/Vs and threshold voltages of 8 V.info:eu-repo/semantics/openAccessSociedad Mexicana de FísicaRevista mexicana de física v.61 n.2 20152015-04-01info:eu-repo/semantics/articletext/htmlhttp://www.scielo.org.mx/scielo.php?script=sci_arttext&pid=S0035-001X2015000200007en
institution SCIELO
collection OJS
country México
countrycode MX
component Revista
access En linea
databasecode rev-scielo-mx
tag revista
region America del Norte
libraryname SciELO
language English
format Digital
author Dominguez-Jimenez,M.A.
Flores-Gracia,F.
Luna-Flores,A.
Martinez-Juarez,J.
Luna-Lopez,J.A.
Alcantara-Iniesta,S.
Rosales-Quintero,P.
Reyes-Betanzo,C.
spellingShingle Dominguez-Jimenez,M.A.
Flores-Gracia,F.
Luna-Flores,A.
Martinez-Juarez,J.
Luna-Lopez,J.A.
Alcantara-Iniesta,S.
Rosales-Quintero,P.
Reyes-Betanzo,C.
Thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysis
author_facet Dominguez-Jimenez,M.A.
Flores-Gracia,F.
Luna-Flores,A.
Martinez-Juarez,J.
Luna-Lopez,J.A.
Alcantara-Iniesta,S.
Rosales-Quintero,P.
Reyes-Betanzo,C.
author_sort Dominguez-Jimenez,M.A.
title Thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysis
title_short Thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysis
title_full Thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysis
title_fullStr Thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysis
title_full_unstemmed Thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysis
title_sort thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysis
description The application of Zinc Oxide (ZnO) films by ultrasonic spray pyrolysis at 250, 300 and 450°C as active layer in thin-film Transistors (TFTs) is presented. The performance of the devices shows an unexpected behavior in function of the deposition temperature. The ZnO films were deposited from 0.2 M precursor solution of Zinc acetate in methanol, using air as carrier gas. 70nm-thick ZnO was deposited over 100 nm-thick aluminum electrodes patterned on 50 nm-thick thermally grown SiO2 on highly doped Si wafers. The highly doped Si wafer was used as the gate electrode. The ZnO TFTs at 250°C showed field-effect mobilities around of 0.05 cm²/Vs and threshold voltages of 8 V.
publisher Sociedad Mexicana de Física
publishDate 2015
url http://www.scielo.org.mx/scielo.php?script=sci_arttext&pid=S0035-001X2015000200007
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