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Predictive Simulation of Semiconductor Processing [electronic resource] : Status and Challenges /
Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.
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| Main Authors: | , , |
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| Format: | Texto biblioteca |
| Language: | eng |
| Published: |
Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer,
2004
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| Subjects: | Materials science., Physics., Engineering., Industrial engineering., Nanotechnology., Materials Science., Characterization and Evaluation of Materials., Mathematical Methods in Physics., Engineering, general., Operating Procedures, Materials Treatment., |
| Online Access: | http://dx.doi.org/10.1007/978-3-662-09432-7 |
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| Summary: | Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool. |
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